| 摘要 |
PROBLEM TO BE SOLVED: To restrain exposure light from becoming uneven in illuminance so as to transfer accurate pattern. SOLUTION: In an exposure process, a substrate through which exposure light penetrates and an adjusting filter which is provided to the substrate and has a low-transmittance part lower in transmittance than the substrate to exposure light are used in an exposure device. The low-transmittance part of the adjusting filter is set lower in transmittance than the exposure light, corresponding to the degree of illuminance of a part of the exposure light of high illuminance, whereby the illuminance difference can be canceled and the exposure light is set almost uniform in illuminance. When an exposure process is carried out, exposure light is made to penetrate through the adjusting filter, before the mask is irradiated with the exposure light projected from an exposure light source, whereby the mask can be irradiated with the exposure light that becomes uniform in illuminance. COPYRIGHT: (C)2005,JPO&NCIPI
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