发明名称 |
SUBSTRATE CARRYING APPARATUS, SUBSTRATE CARRYING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE |
摘要 |
A substrate carrying apparatus for conveying a substrate which is exposed using a pattern image through a projection optical system and a liquid is characterized by comprising a liquid sensor for sensing the liquid adhered to the substrate. A substrate carrying method for conveying a substrate which is exposed using a pattern image through a projection optical system and a liquid is characterized by sensing the liquid adhered to the substrate along the conveying route of the substrate. |
申请公布号 |
WO2005036621(A1) |
申请公布日期 |
2005.04.21 |
申请号 |
WO2004JP14855 |
申请日期 |
2004.10.07 |
申请人 |
ZAO NIKON CO., LTD.;NIKON CORPORATION;OHTA, ATSUSHI;HORIUCHI, TAKASHI |
发明人 |
OHTA, ATSUSHI;HORIUCHI, TAKASHI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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