发明名称 SUBSTRATE CARRYING APPARATUS, SUBSTRATE CARRYING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE
摘要 A substrate carrying apparatus for conveying a substrate which is exposed using a pattern image through a projection optical system and a liquid is characterized by comprising a liquid sensor for sensing the liquid adhered to the substrate. A substrate carrying method for conveying a substrate which is exposed using a pattern image through a projection optical system and a liquid is characterized by sensing the liquid adhered to the substrate along the conveying route of the substrate.
申请公布号 WO2005036621(A1) 申请公布日期 2005.04.21
申请号 WO2004JP14855 申请日期 2004.10.07
申请人 ZAO NIKON CO., LTD.;NIKON CORPORATION;OHTA, ATSUSHI;HORIUCHI, TAKASHI 发明人 OHTA, ATSUSHI;HORIUCHI, TAKASHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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