| 摘要 |
PROBLEM TO BE SOLVED: To grasp accurately a captured state of a reaction secondary product or the like of acquisition means, judge proper maintenance time, and prevent faults such as flow passage blocking or the like during a treatment. SOLUTION: The semiconductor manufacturing apparatus comprises a reaction chamber 1 for processing a substrate 11, an exhaust pipe 12 for discharging exhaust gas from the reaction chamber, a pressure control mechanism 14 which is installed in the exhaust pipe and maintains pressure of the reaction chamber to a predetermined value, an acquisition means 15 which is installed in downstream of the pressure control mechanism and catches the reaction secondary product or the like in the exhaust gas, and pressure detectors 19, 20 which are installed at least one of the upstream and the downstream of the acquisition means in the downstream of the pressure control mechanism. COPYRIGHT: (C)2005,JPO&NCIPI
|
