发明名称 Vacuum leakage detecting device for use in semiconductor manufacturing system
摘要 A vacuum leakage detecting device includes a process chamber for performing processes, a fluid valve, and a dry pump. The device further includes a helium gas sensor to detect helium gas in order to check vacuum leaks in potential external leak points.
申请公布号 US2005081605(A1) 申请公布日期 2005.04.21
申请号 US20040967195 申请日期 2004.10.19
申请人 CHIN KYOUNG-HWAN 发明人 CHIN KYOUNG-HWAN
分类号 G01M3/04;G01M3/22;H01L21/00;(IPC1-7):G01M3/04 主分类号 G01M3/04
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