发明名称 Process of and apparatus for heat-treating II-VI compound semiconductors and semiconductor heat-treated by the process
摘要 A process of heat-treating II-VI compound semiconductors reduces the electrical resistivity without the decrease in crystallinity resulting from the increase in dislocation density. The process comprises the following steps:(a) placing at least one II-VI compound semiconductor in contact with aluminum in a heat-treating chamber having the inside surface formed by at least one material selected from the group consisting of pyrolytic born nitride, hexagonal-system boron nitride, sapphire, alumina, aluminum nitride, and polycrystalline diamond; and (b) heat-treating the II-VI compound semiconductor or semiconductors in a gaseous atmosphere containing the group II element constituting part of the II-VI compound semiconductor or semiconductors. A II-VI compound semiconductor is heat-treated by the foregoing process. An apparatus for heat-treating II-VI compound semiconductors comprises components for performing the foregoing process.
申请公布号 US6881658(B2) 申请公布日期 2005.04.19
申请号 US20020243198 申请日期 2002.09.13
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAMIKAWA YASUO
分类号 H01L29/221;C30B31/10;C30B33/00;H01L21/22;H01L21/225;H01L21/324;H01L21/385;H01L21/477;H01L33/28;(IPC1-7):H01L21/28 主分类号 H01L29/221
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