发明名称 Semiconductor apparatus and process for producing the same, and process for making via hole
摘要 In a semiconductor apparatus, a plurality of HBTs (heterojunction bipolar transistors) are formed on a front surface consisting of a (100) crystal plane of a GaAs substrate. Via holes passing thorough the GaAs substrate are formed in proximity of the HBTs. Each via hole has a rectangular-shaped hole edge at the front surface side of the GaAs substrate. The longitudinal direction of the hole edge on the surface side of the via hole is parallel to the [011] direction of crystal orientation of the GaAs substrate. A width of the via hole in a direction perpendicular to the [011] direction of crystal orientation is larger at the back surface of the substrate than at the front surface thereof.
申请公布号 US6882026(B2) 申请公布日期 2005.04.19
申请号 US20020156558 申请日期 2002.05.29
申请人 SHARP KABUSHIKI KAISHA 发明人 SHIRAKAWA KAZUHIKO
分类号 H01L21/8252;H01L27/06;H01L29/04;H01L29/737;(IPC1-7):H01L21/265 主分类号 H01L21/8252
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