发明名称 |
INFILTRIERTE NANOPORÖSEN MATERIALIEN UND VERFAHREN ZU DEREN HERSTELLUNG |
摘要 |
<p>In accordance with the present invention, a low dielectric constant structural layer is produced having increased mechanical strength and having a plurality of voids that comprises a substrate layer; a low dielectric structural layer juxtaposing the substrate layer; and an infiltrating layer comprising an infiltrating material having a volatile component and a reinforcing component juxtaposing the structural layer and coating at least some of the plurality of voids. Also, methods are provided in which the mechanical strength of a structural layer having a plurality of voids is increased by a) depositing the structural layer on a substrate layer; b) providing an infiltrating material having a volatile component and a reinforcing component; c) introducing the infiltrating material into at least some of the plurality of voids; and d) treating the infiltrating material such that the structural strength is increased by a substantial amount.</p> |
申请公布号 |
AT292320(T) |
申请公布日期 |
2005.04.15 |
申请号 |
AT20000973605T |
申请日期 |
2000.10.17 |
申请人 |
ALLIEDSIGNAL, INC. |
发明人 |
LEUNG, ROGER;SCHAEFER, DAVID;SIKONIA, JOHN |
分类号 |
H01L21/312;H01L21/316;H01L23/498;H01L23/532;(IPC1-7):H01B3/30;H01L23/522 |
主分类号 |
H01L21/312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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