发明名称 ORGANOSILICATE RESIN FORMULATION FOR USE IN MICROELECTRONIC DEVICES
摘要 A curable organosilicate composition that is employed to form one or more layers in the fabrication of electronic devices comprising: (a) an alkoxy or acyloxy silane having at least one group containing ethylenic unsaturation which group is bonded to the silicon atom (b) an alkoxy oracyloxy silane having at least one group containing an aromatic ring which group is bonded to the silicon atom, (c) a latent acid catalyst, and (d) optionally an alkoxy or acyloxy silane having at least one C1-C6 alkyl group bonded to the silicon atom.
申请公布号 WO2004090965(A3) 申请公布日期 2005.04.14
申请号 WO2004US10330 申请日期 2004.03.31
申请人 DOW GLOBAL TECHNOLOGIES INC.;BAIKERIKAR, KIRAN, K.;FENG, SHAOGUANG,;HETZNER, JACK, E.;MAHER, JOHN, M;MILLS, MICHAEL, E.;POPA, PAUL, J.;STRITTMATTER, RICHARD, J.;WILSON, LARRY, R. 发明人 BAIKERIKAR, KIRAN, K.;FENG, SHAOGUANG,;HETZNER, JACK, E.;MAHER, JOHN, M;MILLS, MICHAEL, E.;POPA, PAUL, J.;STRITTMATTER, RICHARD, J.;WILSON, LARRY, R.
分类号 C09D183/04;G03F7/004;G03F7/075;G03F7/09;H01L21/312 主分类号 C09D183/04
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