| 摘要 |
PROBLEM TO BE SOLVED: To conduct an efficient temperature control by abolishing the influence of a temperature between a plurality of wafer bur-in units. SOLUTION: A wafer burn-in apparatus includes the wafer burn-in units 2 each having an upper heating heater at the upper part of a wafer tray, an auxiliary lower heating heater at a lower part, an upper cooling fan 5 above the upper heating heater, a lower cooling fan 6 under the lower heating heater, and an exhaust fan 7 in directions of both side face of the wafer burn-in unit 2. The wafer turn-in apparatus further includes a temperature control means for controlling a temperature independently the heating heaters and the cooling fans 5, 6. Each wafer burn-in unit 2 provides independently an air supply port 8 which communicates with the upper cooling fan 5, and an exhaust port 9 which communicates with the exhaust fan 6. Thus, an independent temperature regulation can be performed by each wafer burn-in unit 2 without exerting an influence to the temperature regulating operation of each wafer burn-in unit 2, and a measured temperature on a semiconductor wafer is stabilized. COPYRIGHT: (C)2005,JPO&NCIPI
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