| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for efficiently producing a phenol resin for photoresist, whereby contamination of a production line due to a sublimate in a photoresist resin is reduced, enhancing the productivity; and a resin composition for photoresist containing the phenol resin for photoresist produced thereby. <P>SOLUTION: The production method for the phenol resin for photoresist includes the following: (a) a step for reacting a phenol with an aldehyde to synthesize a phenol resin A, (b) a step for reacting the phenol resin A dissolved in an organic solvent with an aldehyde in the presence of a solid catalyst to synthesize a phenol resin B, and (c) a step for subjecting the phenol resin B to separation from the solid catalyst and then to reaction and/or concentration. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
