发明名称 Method for fabricating electroluminescent element
摘要 The main object of the present invention is to provide a method for manufacturing an EL element by the photolithography method, capable of preventing color mixture of the edge part of the pattern formed light emitting part, and the different light emitting layer to be laminated later, and preventing the pixel narrowing while providing the advantages of the photolithography method of high light emitting efficiency, high taking out efficiency, the simple manufacturing process, and the high precision pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electro luminescent element of forming a plurality of kinds of light emitting parts on a base substance by patterning light emitting layers of different kinds by a plurality of times by the photolithography method, on the base substance with an electrode layer formed, comprising: a process of forming a light emitting layer and a photoresist layer in this order, on the base substance; a process of pattern exposing and then developing the photoresist layer, so as to the part corresponding to a predetermined light emitting part of the photoresist layer remains; a process of forming a light emitting part which its surface is covered with the photoresist layer, by removing the light emitting layer which is bared because the photoresist layer is removed; a process of forming a photoresist layer on the base substance, so as to cover the light emitting part; and a process of pattern exposing and then developing the photoresist layer, so as not to bare the light emitting part and the end part thereof.
申请公布号 US2005079787(A1) 申请公布日期 2005.04.14
申请号 US20040487179 申请日期 2004.02.18
申请人 KASHIWABARA MITSUHIRO 发明人 KASHIWABARA MITSUHIRO
分类号 H01L27/32;H01L51/52;H01L51/56;H05B33/10;H05B33/12;H05B33/14;(IPC1-7):H05B33/10 主分类号 H01L27/32
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