| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method for simply forming a high definition film-pattern. SOLUTION: The film-forming method comprises (a) a droplet-discharge process for discharging a 1st droplet 70 on a substrate 48, (b) a pinning process for forming a 1st dry-film 75 on the periphery of the 1st droplet 70, (c) a re-dispersing process in which a 2nd droplet 80 is arranged in such a manner as to partly include the 1st dry-film 75, and partly re-disperse the 1st dry-film 75, and (d) re-pinning process for forming a 2nd dry film 85 on the periphery of the 2nd droplet 80. COPYRIGHT: (C)2005,JPO&NCIPI
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