| 摘要 |
The present invention provides below 160 nm optical lithography crystal materials for VUV optical lithography systems and processes. The invention provides fluoride optical lithography crystals for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The present invention provides methods of making below 160 nm optical lithography crystal materials for below 160 nm VUV optical lithography systems and processes. |
