| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning capable of increasing the utilization efficiency of a cleaning gas while keeping the merit of remote plasma type greenhouse gas reduction. SOLUTION: The method for cleaning a process chamber 12 of a CVD apparatus 11 introduces a gas activated in a remote plasma generating device 30 into the process chamber 12, and further activates the gas in the process chamber, and makes the gas react with a deposited substance in the process chamber and exhausts it therefrom. COPYRIGHT: (C)2005,JPO&NCIPI
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