发明名称 FORMING METHOD OF FERROELECTRIC MEMORY CIRCUIT
摘要 PROBLEM TO BE SOLVED: To improve a ferroelectric characteristic of a ferroelectric capacitor. SOLUTION: A forming method of a ferroelectric capacitor used in an integrated circuit comprises steps of forming a lower electrode, a ferroelectric layer, and an upper electrode, and forming/defining an upper electrode by using a first mask and thereafter performing second annealing. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101650(A) 申请公布日期 2005.04.14
申请号 JP20040338232 申请日期 2004.11.22
申请人 SEIKO EPSON CORP 发明人 PATEL DIVYESH N;SHELDON DOUGLAS
分类号 G11C11/22;H01L21/02;H01L21/31;H01L21/314;H01L21/316;H01L21/321;H01L21/324;H01L21/822;H01L21/8242;H01L21/8246;H01L21/8247;H01L27/04;H01L27/10;H01L27/105;H01L27/108;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/105 主分类号 G11C11/22
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