| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a thin film having a smooth laminar structure which has been heretofore difficult to manufacture in a conventional method by suppressing the island structure produced when the film is extremely thin. SOLUTION: The thin film having the laminar structure of a smooth surface, an underlayer thereof and a steep interface is manufactured by depositing the film and bombarding the surface region of a depth of≤20 nm of the deposited film with the ions of rare gas which has an energy within a range from 100 to 300 eV and is heavier than Ne. COPYRIGHT: (C)2005,JPO&NCIPI
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