CLEANING METHOD OF DEPOSITION SYSTEM AND DEPOSITION SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method of a deposition system that prevents a constituent of the deposition system from being damaged, and removes a silicon base deposit in the deposition system. SOLUTION: The cleaning method of a deposition system for removing at least a portion of the silicon nitride deposit deposited on the constituent of the deposition system after using it for depositing a thin film includes: a step for introducing first gas (12) including fluorine gas, and second gas (13) including nitrogen monoxide gas into the deposition system (11); and a step for heating the constituent. The constituent is formed of quartz or silicon carbide, and the silicon nitride deposit includes silicon nitride. COPYRIGHT: (C)2005,JPO&NCIPI