| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for evaluating easily and quickly a film thickness and a distribution thereof of a thin film existing on a material surface, in particular, the method for evaluating the film thickness in a micro-part of the thin film existing on the material surface, and the film thickness distribution in a sample face. SOLUTION: In this method for evaluating the film thickness, an electron is emitted onto the evaluation-objective sample surface having the thin film of low-conductivity on a substrate, while changing an acceleration voltage serially, a secondary electron amount emitted from the evaluation-objective sample surface is measured to correspond to the acceleration voltage, and the thickness of the thin film is determined on the basis of the acceleration voltage varied in the secondary electron amount. COPYRIGHT: (C)2005,JPO&NCIPI
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