发明名称 CULTURE METHOD FOR LONG-DAY PLANT AND FACILITY THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a culture method for long-day plants that is effective when far infrared in the range of the absorption wavelength of phytochrome A of a long-day plant is used and provide a cultivation facility suitable for long-day plants. SOLUTION: This culture method for long-day plant is provided with a step where far infrared light of which main emission wavelength is in the range from 700 to 800 nm, with a photon flux density of≥0.04μmol m<SP>-2</SP>s<SP>-1</SP>is continuously irradiated to long-day plants at an ambient temperature while the time when sunshine is not radiated. Further, the step where the plant is radiated with white light in the period of the time when the sun light is irradiated may be added to the step. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005095132(A) 申请公布日期 2005.04.14
申请号 JP20030433024 申请日期 2003.12.26
申请人 KANEHAMA KOKI;TOSHIBA LIGHTING & TECHNOLOGY CORP 发明人 KANEHAMA KOKI;KATSUTA KEIKO;MORIYAMA IWATOMO
分类号 A01G7/00;A01G1/00;(IPC1-7):A01G7/00 主分类号 A01G7/00
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