Electron beam writing equipment and method

摘要

The present invention provides a writing technique which can perform high-accuracy overlay writing in electron beam writing equipment performing mark detection by light. Electron beam writing equipment has an electron source (101); an electron optical system illuminating a sample (124) with an electron beam emitted from the electron source, to form a desired pattern on the sample by scanning; a stage (125) mounting the sample; a mark substrate (126) provided on the stage; means (128) beaming a light beam for position detection, which is on the same side as the illumination direction of the electron beam, for illuminating the mark substrate; light detection means (123) which is on the same side as the means beaming a light beam, for detecting light reflected from the mark substrate; and electron detection means which is on the side opposite the light detection means with respect to the mark substrate, for detecting a transmitted electron obtained by illumination of the mark substrate by the electron beam, wherein relative position information of the light beam and the electron beam is obtained based on the signals of the detected reflected light and transmitted electron.