发明名称 |
Defect inspection apparatus for phase shift mask |
摘要 |
The present invention relates to a defect inspection apparatus for a phase shift mask that is capable of detecting phase shifter defects that cannot be detected by conventional inspection techniques, by a simple method using an optical method and a comparison of electric signals. In a defect inspection apparatus for a phase shift mask having a phase shifter pattern provided on a mask transparent substrate 1, after the phase shifter pattern has been formed, a phase shifter defect inspection is performed from the mask transparent substrate 1 side of the phase shift mask 1. To perform the defect inspection, light 12 is applied to the phase shift mask 1 from the mask transparent substrate 1 side thereof, and reflection images of at least two different phase shifter pattern fabricated regions are captured by photoelectric conversion light-receiving elements 15a and 15b. The respective image signals 17 and 18 of the reflection images are compared with each other to detect a defect on the mask from the difference between the signals. |
申请公布号 |
US6879393(B2) |
申请公布日期 |
2005.04.12 |
申请号 |
US20010920450 |
申请日期 |
2001.08.01 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOIZUMI YASUHIRO;MURAI SHIAKI;NOGUCHI SHIGERU;TSUCHIYA KATSUHIDE |
分类号 |
G01B11/30;G01N21/896;G01N21/956;G03F1/00;G03F1/08;G03F1/26;G03F1/68;G03F1/84;(IPC1-7):G01N21/00 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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