发明名称 SELF-ALIGNED V0-CONTACT FOR CELL SIZE REDUCTION OF FERAM DEVICES
摘要 <p>An FeRAM (400) comprising includes a ferroelectric material (211) sandwiched between a top electrode (207) and a bottom electrode (209). A V0-contact (405) provides an electrical connection with an underlying CS-contact (223). The V0-contact is aligned using the bottom electrode. A liner layer (403) covers a sidewall of the bottom electrode and provides a stop to an etch a hole forming the V0-contact. A method is utilized to form a V0-contact in an FeRAM. An Fe capacitor of the FeRAM is encapsulated, a bottom electrode is etched, a liner layer is deposited covering a sidewall of the bottom electrode, and a hole is etched for the V0-contact until the etching is stopped by the liner layer.</p>
申请公布号 WO2005031858(A1) 申请公布日期 2005.04.07
申请号 WO2004SG00273 申请日期 2004.08.31
申请人 INFINEON TECHNOLOGIES AG;LIAN, JINGYU;NAGEL, NICOLAS;GERNHARDT, STEFAN;BRUCHHAUS, RAINER;HILLIGER, ANDREAS;WELLHAUSEN, UWE 发明人 LIAN, JINGYU;NAGEL, NICOLAS;GERNHARDT, STEFAN;BRUCHHAUS, RAINER;HILLIGER, ANDREAS;WELLHAUSEN, UWE
分类号 H01L21/02;H01L21/60;(IPC1-7):H01L21/824;H01L27/115;H01L21/768 主分类号 H01L21/02
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