发明名称 |
COMPENSATION FOR EFFECTS OF MISMATCH IN INDICES OF REFRACTION AT A SUBSTRATE-MEDIUM INTERFACE IN NON-CONFOCAL, CONFOCAL, AND INTERFEROMETRIC CONFOCAL MICROSCOPY |
摘要 |
An interferometric microscope (110) for making interferometric measurements of locations within an object (60) that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope (110) including a source (18) for generating an input beam; an interferometer (10) which is configured to receive the input beam and generate therefrom a measurement beam, to focus the measurement beam onto a selected spot in the object (60) and produce for that selected spot a return measurement beam, and to combine the return measurement beam and a reference beam to produce an interference beam; and a detector system (70) which is positioned to receive the interference beam, wherein the return measurement beam travels along a path from the object (60) to the detector system (70) and wherein the interferometer includes a compensating layer of material (50B) positioned in the path of the return measurement beam, the compensating layer (50B) producing a mismatch in the index of refraction along the path of the return measurement beam that compensates for the mismatch between the indices of refraction of the object and the medium. |
申请公布号 |
WO2004070434(A3) |
申请公布日期 |
2005.04.07 |
申请号 |
WO2004US03062 |
申请日期 |
2004.02.04 |
申请人 |
ZETETIC INSTITUTE;HILL, HENRY, ALLEN |
发明人 |
HILL, HENRY, ALLEN |
分类号 |
G02B17/08;G02B21/00;G02B21/14;G02B27/10 |
主分类号 |
G02B17/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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