发明名称 HEAT TREATMENT FURNACE
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment furnace having high stability of the installation of heater elements and no risk of a short circuit thereof. SOLUTION: Terminals 52 are provided on both ends of a corrugated strip-shaped nearly semicircular heater element 5. A nearly circular shape is constructed by bringing the terminals 52 of two heater elements 5, 5 in surface contact with each other, and mounting bases 4 are stacked on along the inner periphery of a cylindrical furnace wall 3, and the heater elements 5, 5 constructing the nearly circular shape are placed respectively on the mounting portions 41 of respective mounting bases 4 and the terminal portions 52 are fixed. A current flows through the heater elements 5, 5 in parallel from the terminals 52, 52 on one side to the terminals 52, 52 on the other side and a semiconductor wafer in the heat-treatment furnace is heated by the heat generated from the heater 51. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005093746(A) 申请公布日期 2005.04.07
申请号 JP20030325523 申请日期 2003.09.18
申请人 SANKO:KK 发明人 KAMINAGA TOSHIHIRO;OKUNO ATSUSHI;TAKAKUWA YASUNORI
分类号 H05B3/64;F27D11/02;H01L21/205;H01L21/22;(IPC1-7):H01L21/22 主分类号 H05B3/64
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