METHOD FOR PRODUCING A STRUCTURE COMPRISING A NARROW CUTTING EDGE OR TIP AND CANTILEVER BEAM PROVIDED WITH A STRUCTURE OF THIS TYPE

摘要

The invention relates to a method for producing a structure (21) comprising a sharp tip or cutting edge (20). A substrate (1), in particular a semiconductor substrate, is provided on one surface (2) with at least one pointed recess (6) that has a tip section (4) and lateral walls (5) and with a layer (7) that is subsequently applied, at least in the region of the recess (6). The structure (21) is then cast in the region of the recess (6) of the substrate (1). According to the invention, prior to the casting process, the layer (7) is provided with an opening (10) in the region of the tip section (4) by selective etching, said opening increasing the height of the recess (6). The invention also relates to a cantilever beam that is produced according to said method.