发明名称 |
NEAR-FIELD LIGHT GENERATING METHOD NEAR-FIELD EXPOSURE MASK AND NEAR-FIELD EXPOSURE METHOD AND APPARATUS |
摘要 |
A near-field light generating method for forming a fine light spot at a portion adjacent to a fine opening having a size of not more than a wavelength of light on a light outgoing side of the fine opening by irradiating the fine opening with the light includes a step of forming a light spot having a length and a width which are substantially equal to each other by the fine opening. The fine opening has a rectangular shape having a length and a width which are different from each other. |
申请公布号 |
WO2005031468(A1) |
申请公布日期 |
2005.04.07 |
申请号 |
WO2004JP14445 |
申请日期 |
2004.09.24 |
申请人 |
CANON KABUSHIKI KAISHA;MIZUTANI, NATSUHIKO;YAMADA, TOMOHIRO |
发明人 |
MIZUTANI, NATSUHIKO;YAMADA, TOMOHIRO |
分类号 |
G01Q60/18;G01Q60/22;G01Q80/00;G02B5/00;G03F1/14;G03F7/20;G11B5/00;G11B7/135;H01L21/027 |
主分类号 |
G01Q60/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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