发明名称 NEAR-FIELD LIGHT GENERATING METHOD NEAR-FIELD EXPOSURE MASK AND NEAR-FIELD EXPOSURE METHOD AND APPARATUS
摘要 A near-field light generating method for forming a fine light spot at a portion adjacent to a fine opening having a size of not more than a wavelength of light on a light outgoing side of the fine opening by irradiating the fine opening with the light includes a step of forming a light spot having a length and a width which are substantially equal to each other by the fine opening. The fine opening has a rectangular shape having a length and a width which are different from each other.
申请公布号 WO2005031468(A1) 申请公布日期 2005.04.07
申请号 WO2004JP14445 申请日期 2004.09.24
申请人 CANON KABUSHIKI KAISHA;MIZUTANI, NATSUHIKO;YAMADA, TOMOHIRO 发明人 MIZUTANI, NATSUHIKO;YAMADA, TOMOHIRO
分类号 G01Q60/18;G01Q60/22;G01Q80/00;G02B5/00;G03F1/14;G03F7/20;G11B5/00;G11B7/135;H01L21/027 主分类号 G01Q60/18
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