| 摘要 |
PROBLEM TO BE SOLVED: To deposit an alloy thin film whose alloy film composition is uniform and film thickness precision is high by a vacuum deposition method, in an electronic component comprising an alloy thin film, and to provide an electronic component having high reliability. SOLUTION: In the vacuum deposition method where an alloy film composed of at least two kinds of metals is deposited, a vapor deposition source is provided by an amount larger than that consumed in one batch. Regarding the composition of the vapor deposition source, compared with the composition of the alloy film, the content of the metal having low vapor pressure is made high. Also, regarding the composition of the alloy supplied for the vapor deposition source after the vapor deposition treatment, compared with the composition of the alloy film, the content of the metal having low vapor pressure is made low. Further, the amount of the alloy to be supplied is equivalent to the one consumed by the vapor deposition treatment. COPYRIGHT: (C)2005,JPO&NCIPI
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