发明名称 MASTER PATTERN DESIGNING SYSTEM AND METHOD FOR THE SAME
摘要 A mask pattern designing system and a mask pattern designing method are provided to shorten the time taken to design and achieve improved efficiency of design by extracting design cases from a database and automatically designing a mask pattern. A mask pattern designing system comprises a client(10) and a server(20). The client takes, as an input, specifications of a mask pattern during design of a shadow mask. The server stores existing design cases of a mask pattern, compares specifications of the mask pattern input from the client and the existing design cases of the mask pattern, extracts a similar designing case, and designs in an optimum way a mask pattern on the basis of the extracted similar design case. The server includes a case database(21) where existing design cases are stored.
申请公布号 KR20050031574(A) 申请公布日期 2005.04.06
申请号 KR20030067763 申请日期 2003.09.30
申请人 LG ELECTRONICS INC. 发明人 JIN, HONG GEE;JUNG, SA BUM;KIM, MIN SUNG
分类号 H01J9/24;(IPC1-7):H01J9/24 主分类号 H01J9/24
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