发明名称 |
MASTER PATTERN DESIGNING SYSTEM AND METHOD FOR THE SAME |
摘要 |
A mask pattern designing system and a mask pattern designing method are provided to shorten the time taken to design and achieve improved efficiency of design by extracting design cases from a database and automatically designing a mask pattern. A mask pattern designing system comprises a client(10) and a server(20). The client takes, as an input, specifications of a mask pattern during design of a shadow mask. The server stores existing design cases of a mask pattern, compares specifications of the mask pattern input from the client and the existing design cases of the mask pattern, extracts a similar designing case, and designs in an optimum way a mask pattern on the basis of the extracted similar design case. The server includes a case database(21) where existing design cases are stored.
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申请公布号 |
KR20050031574(A) |
申请公布日期 |
2005.04.06 |
申请号 |
KR20030067763 |
申请日期 |
2003.09.30 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
JIN, HONG GEE;JUNG, SA BUM;KIM, MIN SUNG |
分类号 |
H01J9/24;(IPC1-7):H01J9/24 |
主分类号 |
H01J9/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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