| 摘要 |
<p>Provided is a positive photoresist composition containing specified surface active agent for preventing coating spots, striped patterns, drop scars generated during application of the composition over high-reflective metal film such as painting, spin-coating after dropping, or injection-nozzle type applications. The composition comprises (A) alkali-soluble novolac resin, (C) naphthoquinone diazide group containing compound, (D) organic solvent and (E) polyester modified polydialkylsiloxane based surface active agent comprising repeat unit represented by the following formula(1) (wherein R1 is linear or branched alkyl group having C1-C3, R2 is linear or branched alkyl group having C1-C15) and another repeat unit represented by the following formula(2) (wherein R1 is linear or branched alkyl group having C1-C3, R3 is polyester modified group). The composition further includes (B) phenol hydroxy group having 1000 or less of molecular weight.</p> |
