DRYING TREATMENT METHOD FOR IMPROVING GENERATION OF DRY GAS, REDUCING DRY GAS GENERATING TIME AND RESTRAINING DEGRADATION OF PREDETERMINED CONDITIONS IN PROCESS CHAMBER AND APPARATUS THEREOF,申请号KR19980017625-传众专利搜索

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发明名称	DRYING TREATMENT METHOD FOR IMPROVING GENERATION OF DRY GAS, REDUCING DRY GAS GENERATING TIME AND RESTRAINING DEGRADATION OF PREDETERMINED CONDITIONS IN PROCESS CHAMBER AND APPARATUS THEREOF
摘要
申请公布号	KR100483310(B1)	申请公布日期	2005.04.06
申请号	KR19980017625	申请日期	1998.05.15
申请人	TOKYO ELECTRON LIMITED	发明人	KOMINO MITSUAKI;UCHISAWA OSAMU
分类号	H01L21/304;H01L21/00;H01L21/08;(IPC1-7):H01L21/08	主分类号	H01L21/304
代理机构		代理人
主权项
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