发明名称 Wafer applied thermally conductive interposer
摘要 A thermally conductive film is attached to an integrated circuit (IC) wafer through a number of steps. Initially, a thermally conductive film is positioned on a first side of a block. Next, an IC wafer that includes a plurality of chips is positioned with its non-active side in contact with the film. Then, a first surface of an elastomer pad is positioned in contact with an active side of the wafer. Next, a predetermined pressure is applied between a second side of the block that is opposite the first side and a second surface of the elastomer pad that is opposite the first surface. Finally, the film, the block, the wafer and the elastomer pad are heated to a predetermined temperature for a predetermined time while a predetermined pressure is applied to bond the film to the wafer without bonding the film to the block.
申请公布号 US6875636(B2) 申请公布日期 2005.04.05
申请号 US20030618953 申请日期 2003.07.14
申请人 DELPHI TECHNOLOGIES, INC. 发明人 BRANDENBURG SCOTT D.;LAUDICK DAVID A.
分类号 C09K5/14;H01L23/373;(IPC1-7):H01L21/50 主分类号 C09K5/14
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