发明名称 THIN FILM APPARATUS, A MANUFACTURING METHOD OF THE THIN FILM APPARATUS, AN ACTIVE MATRIX SUBSTRATE, A MANUFACTURING METHOD OF THE ACTIVE MATRIX SUBSTRATE, AND AN ELECTRO-OPTICAL APPARATUS HAVING THE ACTIVE MATRIX SUBSTRATE
摘要 A manufacturing method of a thin film apparatus, includes: a first step for forming a separation layer on a heat resistant substrate; a second step for forming a thin film device on the separation layer; a third step for providing a surface layer on the thin film device; and a fourth step for generating a peeling phenomenon at the interface of the separation layer and the heat resistant substrate so as to peel the heat resistant substrate from a side of the thin film device.
申请公布号 US6874898(B2) 申请公布日期 2005.04.05
申请号 US20030418109 申请日期 2003.04.18
申请人 RICOH COMPANY, LTD. 发明人 AKIYAMA YOSHIKAZU
分类号 G02F1/1333;G02F1/1368;G02F1/167;G09F9/00;G09F9/30;G09F9/35;H01L21/02;H01L21/336;H01L27/12;H01L27/32;H01L29/786;H01L51/05;H01L51/40;H01L51/56;(IPC1-7):G02B5/08;G02B7/182 主分类号 G02F1/1333
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