发明名称 Apparatus and method for removing coating film
摘要 An apparatus and a method for removing a coating film capable of stable treatment for removing unnecessary coating film at a substrate edge are provided. A substrate is clamped by approach stages from front and rear directions on a chuck, and fixed when accurate registration thereof is achieved. Then, the substrate edge is moved back and forth together with the chuck and the approach stage, so that the edge of the substrate is introduced in a space between an upper piece and a lower piece of a fixed arm portion. While the substrate is being moved, a solvent is fed from a nozzle portion onto a surface thereof and a purge gas is fed through a purge gas feeding pipe, so as to remove the coating film from the surface of the substrate by sucking and discharging the solvent and dissolved coating film through a discharge pipe.
申请公布号 US2005067100(A1) 申请公布日期 2005.03.31
申请号 US20040920407 申请日期 2004.08.18
申请人 TOKYO ELECTRON LIMITED 发明人 KOBAYASHI SHINJI;KOGA NORIHISA
分类号 G03F7/42;B05C11/04;B05C11/10;B05C13/00;B05D3/10;C03C17/00;C23F1/00;G03F7/16;H01L21/027;(IPC1-7):C23F1/00 主分类号 G03F7/42
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