EXPOSURE APPARATUS AND DEVICE PRODUCING METHOD

摘要

An exposure apparatus for exposing a substrate by projecting an image of a pattern onto a substrate through a projection optical system and a liquid. The exposure apparatus has a liquid supply mechanism and a liquid recovery mechanism. The liquid supply mechanism supplies a liquid onto a substrate from above of the substrate through a first and second supply openings arranged near a projection area where the pattern image is projected. The liquid recovery mechanism recovers the liquid on the substrate from the above of the substrate through an inner recovery opening provided outside the first and second supply openings and an outer recovery opening provided further outside the inner recovery opening.