发明名称 Semiconductor apparatus and method of fabricating the same
摘要 A semiconductor apparatus includes a first conductive film and a second conductive film provided on respective sides of an insulating resin film. A circuit element is mounted on the second conductive film. The circuit element is electrically connected to the second conductive film. The second conductive film is provided to cover a via plug. The via plug is tapered with a progressively smaller diameter toward the second conductive film and away from the first conductive film.
申请公布号 US2005067712(A1) 申请公布日期 2005.03.31
申请号 US20040951214 申请日期 2004.09.27
申请人 IMAOKA TOSHIKAZU;USUI RYOSUKE;NAKANO ATSUSHI;KATO ATSUSHI 发明人 IMAOKA TOSHIKAZU;USUI RYOSUKE;NAKANO ATSUSHI;KATO ATSUSHI
分类号 H01L23/12;H01L23/498;(IPC1-7):H01L23/48 主分类号 H01L23/12
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