发明名称 |
Semiconductor apparatus and method of fabricating the same |
摘要 |
A semiconductor apparatus includes a first conductive film and a second conductive film provided on respective sides of an insulating resin film. A circuit element is mounted on the second conductive film. The circuit element is electrically connected to the second conductive film. The second conductive film is provided to cover a via plug. The via plug is tapered with a progressively smaller diameter toward the second conductive film and away from the first conductive film.
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申请公布号 |
US2005067712(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20040951214 |
申请日期 |
2004.09.27 |
申请人 |
IMAOKA TOSHIKAZU;USUI RYOSUKE;NAKANO ATSUSHI;KATO ATSUSHI |
发明人 |
IMAOKA TOSHIKAZU;USUI RYOSUKE;NAKANO ATSUSHI;KATO ATSUSHI |
分类号 |
H01L23/12;H01L23/498;(IPC1-7):H01L23/48 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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