METHOD FOR DESIGNING PHOTOMASK, PHOTOMASK AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To decrease the data quantity for correction of a pattern obliquely disposed in patterns for drawing a mask pattern on a photomask while maintaining the accuracy almost equal to correction of a pattern disposed in parallel.

SOLUTION: In correcting a reference pattern disposed in parallel arrangement, edges of the reference pattern is divided into many regions, and each region is corrected by shifting the edge by the correction amount preliminarily determined. In correcting a reference pattern in an oblique arrangement, the edge of the reference pattern is divided into two regions of a proximity region and a remote region, and each region is corrected by shifting the edge by the correction amount preliminarily determined.

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