| 摘要 |
PROBLEM TO BE SOLVED: To provide a wave aberration measuring device provided with an analysis means of wave aberration of an optical system to be inspected for a plurality of wavelengths, by selecting coherent light of a plurality of wave lengths, using an interferometer. SOLUTION: Each laser light source 1-1 and 1-2 for outputting laser light of each wave lengthλ<SB>1</SB>,λi is provided in an illumination system 1. One of laser light sources 1-1 and 1-2 is selected in matching with the wavelengthsλ<SB>1</SB>,λi of the optical system to be inspected 8 for analyzing wave aberration. In the wave aberration analysis system 2, the wave aberrations of the optical system 8 to be inspected are analyzed based on the wavelengthsλ<SB>1</SB>,λi of the laser light selected in the illumination system 1 and an interference pattern image data. COPYRIGHT: (C)2005,JPO&NCIPI
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