APPARATUS FOR FORMING CARBON-BASED THIN FILM, FILM-FORMING APPARATUS AND FILM-FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film-forming technology for further optimizing a quality and structure of a carbon-based thin film.

SOLUTION: This film-forming apparatus comprises a vacuum vessel (1) for accommodating a workpiece (W); raw material-feeding mechanisms (4, 7 and 8) for feeding a raw material of the carbon-based thin film to be formed on the surface of the workpiece (W); an electrode (6) which is accommodated in the vacuum vessel (1) and holds the workpiece (W); and a power source (11) for generating plasma, which applies voltage for generating plasma inside the vacuum vessel (1) to the electrode (6). The voltage for generating plasma applied to the electrode (6) comprises a pulsed alternating current with RF (Radio Frequency) (22) in which alternating voltage is continued with a frequency in a radio frequency RF band for a predetermined period of time, a pulsed direct current having positive voltage (21), and a pulsed direct current having negative voltage (23).

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