发明名称 Exposure system and production method for exposure system
摘要 The invention is directed to the provision of an exposure apparatus that can determine a correction value for each individual light-emitting part by employing a method that detects the amount of light corresponding to one particular light-emitting part from composite light containing light rays from adjacent light-emitting parts, and also to the provision of a method for producing such an exposure apparatus. The production method according to the invention comprises the steps of lighting a plurality of light-emitting parts at the same time, detecting an output light-amount distribution across all of the plurality of light-emitting parts by making measurements using a line-like light-receiving device, detecting a peak position corresponding to each light-emitting part by using the output light-amount distribution; detecting the amount of light of each light-emitting part based on the peak position, and determining, based on the amount of light of each light-emitting part, the correction value for correcting nonuniformity in the amount of light of the light-emitting part.
申请公布号 US2005068590(A1) 申请公布日期 2005.03.31
申请号 US20040498061 申请日期 2004.06.09
申请人 SHIOTA AKIRA;YASUNAGA MAKOTO;MASUBUCHI SADAO;IWAKO AKINOBU;YOKOYAMA MASAFUMI 发明人 SHIOTA AKIRA;YASUNAGA MAKOTO;MASUBUCHI SADAO;IWAKO AKINOBU;YOKOYAMA MASAFUMI
分类号 B41J2/45;G06K15/12;(IPC1-7):H04N1/04 主分类号 B41J2/45
代理机构 代理人
主权项
地址