| 摘要 |
PROBLEM TO BE SOLVED: To provide a new fluorine-containing polymerizable cyclic olefin that is useful as a raw material for a base resin of a photoresist material because it has excellent transparency to radial rays of, for example,≤200 nm wavelength, particularly≤160 nm wavelength, further excellent etching resistance to the dry etching and shows good image-developing properties with the hydrophobic properties suppressed. SOLUTION: The fluorine-containing polymerizable cyclic olefin bears at least one of partial structure represented by general formula (1) or (2). COPYRIGHT: (C)2005,JPO&NCIPI
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