METHOD FOR FORMING DIFFUSED REFLECTION FILM FOR THE PHOTO-RESIST PATTERN TO BE FORM PRECISELY,申请号KR20020033780-传众专利搜索

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发明名称	METHOD FOR FORMING DIFFUSED REFLECTION FILM FOR THE PHOTO-RESIST PATTERN TO BE FORM PRECISELY
摘要
申请公布号	KR100479960(B1)	申请公布日期	2005.03.30
申请号	KR20020033780	申请日期	2002.06.17
申请人		发明人
分类号	H01L21/027;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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