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发明名称
Lithographic apparatus, device manufacturing method, and device manufactured thereby
摘要
申请公布号
EP1491962(A3)
申请公布日期
2005.03.30
申请号
EP20040076828
申请日期
2004.06.23
申请人
ASML NETHERLANDS B.V.
发明人
VAN EMPEL, TJARKO ADRIAAN RUDOLF;ZAAL, KOEN JACOBUS JOHANNES MARIA;VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES;AANTJES, TON
分类号
G03F7/20;(IPC1-7):G03F7/20
主分类号
G03F7/20
代理机构
代理人
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