CHEMICAL TANK FOR WAFER CLEANING

摘要

A chemical tank for wafer cleaning process is provided to remove an unnecessary space between a chemical bath and a wafer and maximize cleaning efficiency by forming a bottom part of the chemical bath with a shape of arc equivalent to a half-circle of the wafer. A chemical bath(20) is used for storing chemicals for cleaning a wafer(2). A bottom part of the chemical bath is formed with a shape of arc equivalent to a half-circle of the wafer dipped into the chemical bath. A gas injection part(30) is installed at the bottom part of the chemical tank in order to inject a cleaning gas into the inside of the chemical bath. The gas injection part is used for discharging the cleaning gas to the vertical direction.