LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus and a method of manufacturing a device are provided to control exactly discretely the flatness of an active surface in a patterning member by using a height controlling structure. A lithographic apparatus(200) includes an illumination system, a patterning array, a mounting plate, a height controlling structure, a substrate table and a projection system. The illumination system(202) supplies a projective beam of radiation. The patterning array(204) is used for patterning the projective beam. The patterning array is composed of a plurality of elements. Each element is capable of being discretely controlled. The mounting plate is used for mounting the patterning array. The height controlling structure is used for controlling locally the height of an active surface in the patterning array. The substrate table supports a substrate. The projection system(210) is used for projecting the patterned beam to a target.