发明名称 Systems and methods for depositing material onto microfeature workpieces in reaction chambers
摘要 Systems and methods for depositing material onto a microfeature workpiece in a reaction chamber are disclosed herein. In one embodiment, the system includes a gas supply assembly having a first gas source, a first gas conduit coupled to the first gas source, a first valve assembly, a reaction chamber, and a gas distributor carried by the reaction chamber. The first valve assembly includes first and second valves that are in fluid communication with the first gas conduit. The first and second valves are configured in a parallel arrangement so that the first gas flows through the first valve and/or the second valve. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
申请公布号 US2005061243(A1) 申请公布日期 2005.03.24
申请号 US20030665908 申请日期 2003.09.18
申请人 SARIGIANNIS DEMETRIUS;MENG SHUANG;DERDERIAN GARO J. 发明人 SARIGIANNIS DEMETRIUS;MENG SHUANG;DERDERIAN GARO J.
分类号 C23C16/44;C23C16/455;(IPC1-7):C23C16/00 主分类号 C23C16/44
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