MANUFACTURING DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing device and a manufacturing method of the semiconductor device. SOLUTION: A device and a method are provided for forming a microfine particle porous thin film on a substrate to be processed, with a large area and with a flow regulating mechanism for controlling the flow of the carrier gas, and an evaporation source for permitting the supply of a large amount of material in the evaporating method in gas. The manufacturing method of the microfine particle porous insulating thin film is performed, by processing the thin film manufactured by the method for forming the microfine particle porous thin film through oxidation treatment. COPYRIGHT: (C)2005,JPO&NCIPI