发明名称 EXPOSURE DEVICE, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an exposure device and an exposure system that can prevent the degrading of an optical system or the like provided in the exposure device even if any trouble occurs in the supply of a transparent gas. SOLUTION: A nitrogen gas supply/recovery device 2 supplies a nitrogen gas to a plurality of exposure devices 1. The exposure devices 1 are respectively provided with a nitrogen gas tank 7, and in case when the supply of the nitrogen gas to the exposure device 1 from the nitrogen gas supply/recovery device 2 is stopped due to power failure, the nitrogen gas is supplied to the exposure devices 1 from the nitrogen gas tanks 7. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005079294(A) 申请公布日期 2005.03.24
申请号 JP20030307026 申请日期 2003.08.29
申请人 NIKON CORP 发明人 YOSHIMOTO HIROMITSU
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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