发明名称 METHOD AND DEVICE FOR DEPOSITING SINGLE COMPONENT OR MULTICOMPONENT LAYERS AND SERIES OF LAYERS USING NON-CONTINUOUS INJECTION OF LIQUID AND DISSOLVED STARTING MATERIAL BY A MULTI-CHANNEL INJECTION UNIT
摘要 The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber (2). Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a tempered vaporization chamber (4) by means of non-continuous injection of a liquid starting material (3) or a starting material (3) dissolved in a liquid using a respective injector unit (5). Said vapor is guided to the process chamber by means of a carrier gas (7). It is important to individually adjust or vary the material flow parameters, such as injection frequency and the pulse/pause ratio and the phase relation of the pulse/pauses to the pulse/pauses of the other injector unit (s), determining the time response of the flow of material through each injector unit (5). The pressure in the process chamber (2) is less than 100 mbars, the process chamber (2) is tempered and several series of layers are deposited on the substrate (1) during one process step.
申请公布号 WO2005026401(A2) 申请公布日期 2005.03.24
申请号 WO2004EP52063 申请日期 2004.09.07
申请人 AIXTRON AG;SCHUMACHER, MARCUS;BAUMANN, PETER;LINDNER, JOHANNES;DESCHLER, MARC 发明人 SCHUMACHER, MARCUS;BAUMANN, PETER;LINDNER, JOHANNES;DESCHLER, MARC
分类号 C23C16/44;C23C16/448;C23C16/52 主分类号 C23C16/44
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