发明名称 Electron beam system and electron beam measuring and observing methods
摘要 To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect to a plane which is used to tilt a sample by a sample tilting section 5, an approximate coordinate measuring section 28 for obtaining an approximate shape or approximate coordinate values of the sample based on an output corresponding to a stereo image from an electron beam detecting section 4, an image correcting section 30 for correcting the stereo image according to the tilt angle created by the sample tilting section 5 based on the shape or coordinate values of the sample obtained in the approximate coordinate measuring section 28 using a correction factor stored in the correction factor storing section 32, and a precise coordinate measuring section 34 for obtaining a shape or coordinate values of the sample which are more precise than those obtained in the approximate coordinate measuring section 28 based on a corrected stereo image obtained in the image correcting section 30.
申请公布号 US2005061972(A1) 申请公布日期 2005.03.24
申请号 US20040897434 申请日期 2004.07.23
申请人 TOPCON CORPORATION 发明人 KOCHI NOBUO;KOIKE HIROTAMI;TSURUGA YASUKO;OKADA SHINICHI
分类号 H01J37/28;(IPC1-7):G01N23/00 主分类号 H01J37/28
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