发明名称 |
Marking method and marking apparatus using multiple photon absorption, marked optical element manufactured by using the marking method and the marking apparatus |
摘要 |
A marking method is provided which permits an easy detecting of the presence of a mark without using a specific reading apparatus, and is capable of avoiding a damage as well as a strength deterioration of an object material. The marking method comprises: preparing a marking object; converging, into the marking object, a laser beam having a wave length range so chosen that the laser beam can transmit through a material forming the marking object, and then effecting a multiple photon absorption; and moving a converging position of the laser beam, in a manner such that an area, whose refractive index is changed due to the multiple photon absorption, can form a diffraction pattern capable of diffracting a visible light.
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申请公布号 |
US6869749(B2) |
申请公布日期 |
2005.03.22 |
申请号 |
US20030622488 |
申请日期 |
2003.07.21 |
申请人 |
SUMITOMO HEAVY INDUSTRIES, LTD. |
发明人 |
HAYASHI KEN-ICHI;ITOH KAZUYOSHI |
分类号 |
B41J3/00;B23K26/00;B41M5/26;G02B5/18;(IPC1-7):B23K26/14;G03C9/08 |
主分类号 |
B41J3/00 |
代理机构 |
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代理人 |
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主权项 |
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